Please join us for our first MAS webinar! Vin Smentkowski will cover various techniques for Surface Microscopy and Microanalysis in the Industrial Research and Development Laboratory at GE.
The live webinar will consist of a 50 minute presentation, followed by a Q&A. The webinar is free but requires a registration.
When: July 15, 2020 at 2 p.m. EDT.
Webinar description: The top few nanometers of a sample is defined as the surface. The surface is where most chemical reactions take place. There are many instances where the surface of materials are designed/functionalized in order to optimize properties and improve device performance; there are other instances where the surface becomes compromised and the material/device performance degrades.
Auger Electron Spectroscopy (AES), X-ray Photoelectron Spectroscopy (XPS), and Time of Flight Secondary Ion Mass Spectrometry (ToF-SIMS) are the three most common, and commercially available, surface analysis techniques. These techniques provide complimentary information regarding the composition/microstructure of the surface of a sample. In this presentation, I will introduce AES, XPS, and ToF-SIMS, show typical data, and discuss how the data helped understand mechanisms and/or resolve material problems. I will also introduce techniques which we do not have in-house, but have access to via external collaborations.
Surface analysis, Auger electron spectroscopy, X-ray photoelectron spectroscopy, time of flight secondary ion mass spectroscopy, atom probe tomography, AES, XPS, ToF-SIMS, APT